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Zastosuj identyfikator do podlinkowania lub zacytowania tej pozycji: http://hdl.handle.net/20.500.12128/349
Tytuł: Multifractal characteristics of titanium nitride thin films
Autor: Talu, Stefan
Stach, Sebastian
Valedbagi, Shahoo
Bavadi, Reza
Elahi, S. Mohammad
Talu, Mihai
Słowa kluczowe: Atomic force microscopy; DC magnetron sputtering; Multifractal analysis; Surface roughness; Titanium nitride (TiN) thin film
Data wydania: 2015
Źródło: Materials Science Poland, Vol. 33, iss. 3 (2015), s. 541-548
Abstrakt: The study presents a multi-scale microstructural characterization of three-dimensional (3-D) micro-textured surface of titanium nitride (TiN) thin films prepared by reactive DC magnetron sputtering in correlation with substrate temperature variation. Topographical characterization of the surfaces, obtained by atomic force microscopy (AFM) analysis, was realized by an innovative multifractal method which may be applied for AFM data. The surface micromorphology demonstrates that the multifractal geometry of TiN thin films can be characterized at nanometer scale by the generalized dimensions Dq and the singularity spectrum f(α). Furthermore, to improve the 3-D surface characterization according with ISO 25178-2:2012, the most relevant 3-D surface roughness parameters were calculated. To quantify the 3-D nanostructure surface of TiN thin films a multifractal approach was developed and validated, which can be used for the characterization of topographical changes due to the substrate temperature variation.
URI: http://hdl.handle.net/20.500.12128/349
DOI: 10.1515/msp-2015-0086
ISSN: 2083-1331
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